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Extreme Ultraviolet (EUV) Lithography Market by Equipment (Masks, Light Sources, Optics), By End-Use (Integrated Device Manufacturer, Foundries), by Region; Global Insights & Forecast (2024 – 2030)

Published: February, 2024  
|   Report ID: SE3185  
|   Semiconductor and Electronics

As per Intent Market Research, the Extreme Ultraviolet (EUV) Lithography Market is projected to grow from USD 9.0 billion in 2023-e to USD 34.5 billion by 2030, registering a CAGR of 21.2% during the forecast period (2024-2030).

The Extreme Ultraviolet (EUV) Lithography market is positioned at the forefront of advanced semiconductor manufacturing technologies, primarily due to its capability to produce smaller and more efficient microchips. EUV lithography employs light in the extreme ultraviolet spectrum, allowing for finer patterning of semiconductor devices compared to traditional lithography methods. As the demand for high-performance computing, artificial intelligence, and 5G technology escalates, the EUV lithography market is set to experience significant growth. This is driven by the industry's need for enhanced chip density and improved performance at reduced power consumption, which are critical in meeting the challenges posed by contemporary electronic devices.

This growth is primarily fueled by the rising demand for advanced semiconductors in various applications, including consumer electronics, automotive, and industrial sectors. As of 2024, the market's base year, significant investments from leading semiconductor manufacturers and an increasing number of fabs implementing EUV technology will drive market expansion.

Extreme Ultraviolet (EUV) Lithography Market

Equipment Segment is Largest Owing to High Demand for Advanced Lithography Tools

Within the EUV lithography market, the equipment segment represents the largest share, primarily driven by the growing need for sophisticated lithography machines capable of producing smaller node chips. As semiconductor manufacturers transition from 7nm to 5nm and beyond, the reliance on cutting-edge equipment becomes paramount. Leading companies such as ASML dominate this segment with their advanced EUV lithography systems, which offer unparalleled resolution and productivity in the chip manufacturing process.

The high cost of EUV lithography equipment, often exceeding USD 150 million per system, underscores the significant capital investment required by semiconductor manufacturers. However, this investment is justified by the potential for enhanced chip performance and the ability to meet increasing consumer demand for high-performance devices. The focus on miniaturization and increased efficiency in semiconductor design will continue to drive growth within the equipment segment, ensuring its status as the largest contributor to the EUV lithography market.

Material Segment is Fastest Growing Owing to Technological Advancements

The material segment in the EUV lithography market is the fastest-growing sub-segment, fueled by the ongoing advancements in photoresist materials and their critical role in achieving optimal lithography performance. The introduction of new materials specifically designed for EUV processes has improved pattern fidelity and reduced defects, which are crucial for the manufacturing of next-generation semiconductors. As semiconductor fabs increase their adoption of EUV lithography, the demand for innovative materials is rapidly rising.

Furthermore, the continuous development of high-performance photoresists that can withstand the intense energy of EUV light is driving this segment's growth. Manufacturers are investing in research and development to create materials that not only enhance the lithography process but also contribute to the overall efficiency and yield of semiconductor production. This focus on materials innovation positions the materials segment as a pivotal player in the EUV lithography market's future growth trajectory.

Services Segment is Largest Owing to Support in Adoption

In the EUV lithography market, the services segment holds the largest share, reflecting the increasing need for maintenance, training, and consulting services related to EUV systems. As semiconductor manufacturers adopt EUV technology, the complexity of these systems necessitates comprehensive support services to ensure optimal performance and minimize downtime. Companies require expert guidance in integrating EUV lithography into their existing processes, thus fueling demand for specialized services.

Moreover, the trend toward outsourcing maintenance and technical support is becoming prevalent among semiconductor fabs, leading to a surge in service contracts. This growing reliance on service providers not only enhances operational efficiency but also allows manufacturers to focus on core competencies while leveraging external expertise. As a result, the services segment is positioned for robust growth, making it a key component of the EUV lithography market landscape.

Fastest Growing Region is Asia-Pacific Owing to Robust Semiconductor Manufacturing

The Asia-Pacific region is emerging as the fastest-growing market for EUV lithography, driven by the concentration of semiconductor manufacturing in countries such as Taiwan, South Korea, and China. The presence of major semiconductor foundries and the increasing investment in advanced manufacturing technologies contribute significantly to the region's growth. As these countries strive to maintain a competitive edge in the global semiconductor landscape, the adoption of EUV lithography becomes imperative.

Additionally, government initiatives to support the semiconductor industry and boost local manufacturing capabilities further propel the demand for EUV technology in the region. The Asia-Pacific market is expected to witness a CAGR of over 20% during the forecast period, as the region’s fabs upgrade their technology to produce more advanced chips. This trend underscores the significance of the Asia-Pacific region in the overall EUV lithography market, positioning it as a crucial area for future growth and innovation.

Leading Companies and Competitive Landscape

The competitive landscape of the EUV lithography market is characterized by a few key players who dominate the market with their advanced technologies and extensive experience. Leading companies include ASML, Canon, Nikon, Samsung Electronics, Intel Corporation, Taiwan Semiconductor Manufacturing Company (TSMC), Micron Technology, GLOBALFOUNDRIES, and Qualcomm.

ASML stands out as the market leader, providing cutting-edge EUV lithography systems that are essential for producing the latest semiconductor chips. The company’s continuous investment in research and development ensures it remains at the forefront of technological advancements in EUV lithography. Additionally, collaborations between semiconductor manufacturers and equipment providers are becoming increasingly common, driving innovation and enhancing competitive dynamics within the market. As the demand for advanced semiconductor technology grows, these leading companies are well-positioned to capitalize on the opportunities presented by the expanding EUV lithography market.

Report Objectives:

The report will help you answer some of the most critical questions in the Extreme Ultraviolet (EUV) Lithography Market. A few of them are as follows:

  1. What are the key drivers, restraints, opportunities, and challenges influencing the market growth?
  2. What are the prevailing technology trends in the Extreme Ultraviolet (EUV) Lithography market?
  3. What is the size of the Extreme Ultraviolet (EUV) Lithography market based on segments, sub-segments, and regions?
  4. What is the size of different market segments across key regions: North America, Europe, Asia Pacific, Latin America, Middle East & Africa?
  5. What are the market opportunities for stakeholders after analyzing key market trends?
  6. Who are the leading market players and what are their market share and core competencies?
  7. What is the degree of competition in the market and what are the key growth strategies adopted by leading players?
  8. What is the competitive landscape of the market, including market share analysis, revenue analysis, and a ranking of key players?

Report Scope:

Report Features

Description

Market Size (2023-e)

USD 9.0 billion

Forecasted Value (2030)

USD 34.5 billion

CAGR (2024-2030)

21.2%

Base Year for Estimation

2023-e

Historic Year

2022

Forecast Period

2024-2030

Report Coverage

Market Forecast, Market Dynamics, Competitive Landscape, Recent Developments

Segments Covered

Extreme Ultraviolet (EUV) Lithography Market by Equipment (Masks, Light Sources, Optics), By End-Use (Integrated Device Manufacturer, Foundries)

Regional Analysis

North America (US, Canada), Europe (Germany, France, UK, Spain, Italy & Rest of Europe), Asia Pacific (China, Japan, South Korea, India, and rest of Asia Pacific), Latin America (Brazil, Mexico, Argentina, & Rest of Latin America), Middle East & Africa (Saudi Arabia, South Africa, Turkey, United Arab Emirates, & Rest of MEA)

Customization Scope

Customization for segments, region/country-level will be provided. Moreover, additional customization can be done based on the requirements

1.Introduction

1.1.Market Definition

1.2.Scope of the Study

1.3.Research Assumptions

1.4.Study Limitations

2.Research Methodology

2.1.Research Approach

2.1.1.Top-Down Method

2.1.2.Bottom-Up Method

2.1.3.Factor Impact Analysis

2.2.Insights & Data Collection Process

2.2.1.Secondary Research

2.2.2.Primary Research

2.3.Data Mining Process

2.3.1.Data Analysis

2.3.2.Data Validation and Revalidation

2.3.3.Data Triangulation

3.Executive Summary

3.1.Major Markets & Segments

3.2.Highest Growing Regions and Respective Countries

3.3.Impact of Growth Drivers & Inhibitors

3.4.Regulatory Overview by Country 

4.Extreme Ultraviolet (EUV) Lithography Market, by Equipment (Market Size & Forecast: USD Billion, 2024 – 2030)

4.1.Light Source

4.3.Masks

4.4.Optics

4.4.Others

5.Extreme Ultraviolet (EUV) Lithography Market, by End-use (Market Size & Forecast: USD Billion, 2024 – 2030)

5.1.Foundries

5.2.Integrated Device Manufacturers (IDM)

6.Regional Analysis (Market Size & Forecast: USD Billion, 2024 – 2030)

6.1.Regional Overview

6.2.North America

6.2.1.Regional Trends & Growth Drivers

6.2.2.Barriers & Challenges

6.2.3.Opportunities

6.2.4.Factor Impact Analysis

6.2.5.Technology Trends

6.2.6.North America Extreme Ultraviolet (EUV) Lithography Market, by Equipment

6.2.7.North America Extreme Ultraviolet (EUV) Lithography Market, by End-use

                                    *Similar segmentation will be provided at each regional level

6.3.By Country

6.3.1.US

6.3.1.1.US Extreme Ultraviolet (EUV) Lithography Market, by Equipment

6.3.1.2.US Extreme Ultraviolet (EUV) Lithography Market, by End-use

6.3.2.Canada

*Similar segmentation will be provided at each country level

6.4.Europe

6.5.APAC

6.7.Latin America

6.8.Middle East & Africa

7.Competitive Landscape

7.1.Overview of the Key Players

7.2.Competitive Ecosystem

7.2.1.Platform Manufacturers

7.2.2.Subsystem Manufacturers

7.2.3.Service Providers

7.2.4.Software Providers

7.3.Company Share Analysis

7.4.Company Benchmarking Matrix

7.4.1.Strategic Overview

7.4.2.Product Innovations

7.5.Start-up Ecosystem

7.6.Strategic Competitive Insights/ Customer Imperatives

7.7.ESG Matrix/ Sustainability Matrix

7.8.Manufacturing Network

7.8.1.Locations

7.8.2.Supply Chain and Logistics

7.8.3.Product Flexibility/Customization

7.8.4.Digital Transformation and Connectivity

7.8.5.Environmental and Regulatory Compliance

7.9.Technology Readiness Level Matrix

7.10.Technology Maturity Curve

7.11.Buying Criteria

8.Company Profiles

8.1.ASML

8.1.1.Company Overview

8.1.2.Company Financials

8.1.3.Product/Service Portfolio

8.1.4.Recent Developments

8.1.5.IMR Analysis

        *Similar information will be provided for other companies 

8.2.Toppan

8.3.KLA Corporation

8.4.NTT Advanced Technology

8.5.Carl Zeiss

8.6.Ushio Inc.

8.7.Advantest Corporation

8.8.NTT Advanced Technology

8.9.SUSS Microtec

8.10.Lasertec Corporation

9.Appendix

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A comprehensive market research approach was employed to gather and analyze data on the Extreme Ultraviolet (EUV) Lithography Market. In the process, the analysis was also done to estimate the parent market and relevant adjacencies to major the impact of them on the Extreme Ultraviolet (EUV) Lithography Market. The research methodology encompassed both secondary and primary research techniques, ensuring the accuracy and credibility of the findings.

Research Approach - Extreme Ultraviolet (EUV) Lithography Market

Secondary Research

Secondary research involved a thorough review of pertinent industry reports, journals, articles, and publications. Additionally, annual reports, press releases, and investor presentations of industry players were scrutinized to gain insights into their market positioning and strategies.

Primary Research

Primary research involved conducting in-depth interviews with industry experts, stakeholders, and market participants across the Extreme Ultraviolet (EUV) Lithography ecosystem. The primary research objectives included:

  • Validating findings and assumptions derived from secondary research
  • Gathering qualitative and quantitative data on market trends, drivers, and challenges
  • Understanding the demand-side dynamics, encompassing end-users, component manufacturers, facility providers, and service providers
  • Assessing the supply-side landscape, including technological advancements and recent developments

Market Size Estimation

A combination of top-down and bottom-up approaches was utilized to estimate the overall size of the Extreme Ultraviolet (EUV) Lithography market. These methods were also employed to estimate the size of various subsegments within the market. The market size estimation methodology encompassed the following steps:

  1. Identification of key industry players and relevant revenues through extensive secondary research
  2. Determination of the industry's supply chain and market size, in terms of value, through primary and secondary research processes
  3. Calculation of percentage shares, splits, and breakdowns using secondary sources and verification through primary sources

Bottom Up and Top Down - Extreme Ultraviolet (EUV) Lithography Market

Data Triangulation

To ensure the accuracy and reliability of the market size estimates, data triangulation was implemented. This involved cross-referencing data from various sources, including demand and supply side factors, market trends, and expert opinions. Additionally, top-down and bottom-up approaches were employed to validate the market size estimates.

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